Electrophysical properties of double-layer nickel-base and vanadium-base films within the intermediate temperature range by A. Chornous, I. Protsenko, and I. Shpetnyi

Crystal Research and Technology

Cryst. Res. Technol. 39, 602 (2004) - Abstract -

Electrophysical properties of double-layer nickel-base and vanadium-base films within the intermediate temperature range

A. Chornous, I. Protsenko, and I. Shpetnyi

Sumy State University, 2 Rimsky-Korsakov Str., Sumy 40007, Ukraine

Keywords	double-layer films, phase composition, temperature coefficient of resistance, grain boundary scattering, resistivity
PACS	68.55.Nq
DOI	10.1002/crat.200310231

Phase composition of the double-layer Ni-base and V-base films obtained and annealed in vacuum of 10^-4-10^-5 Pa within the temperature range of 700-900 K is studied by technique of electronography and transmission electron microscopy. Temperature dependence of resistance and temperature coefficient of resistance (TCR) was investigated. Comparison of TCR experimental data with the calculated data was made at Ò=300 K on basis of semiclassical and macroscopic models and formula for TCR of alloys.

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