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Crystal Research and Technology |
Cryst. Res. Technol. 42, 290 (2007) - Abstract -
Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films
S. V. Jagadeesh Chandra, G. Mohan Rao*, and S. Uthanna
Department of Physics, Sri Venkateswara University, Tirupati - 517 502, India
*Department of Instrumentation, Indian Institute of Science, Bangalore - 560 012, India
| Keywords | tantalum oxide, magnetron sputtering, structure, optical absorption |
| PACS | 81.40, 68.55, 78.65.p |
| DOI | 10.1002/crat.200610815 |
Rf magnetron sputtering technique was employed for preparation of tantalum oxide films on quartz and crystalline silicon (111) substrates held at room temperature by sputtering of tantalum in an oxygen partial pressure of 1x10-4 mbar. The films were annealed in air for an hour in the temperature range 573 – 993 K. The effect of annealing on the chemical binding configuration, structure and optical absorption of tantalum oxide films was systematically studied.
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