Crystal Research and Technology
Cryst. Res. Technol. 42, 905 (2007) - Abstract -

Precise determination of residual stresses in FeSi3 electrical sheets in the vicinity of laser scratches with high lateral resolution

M. Böhling and J. Bauch

Institute of Materials Science, Dresden University of Technology, 01062 Dresden, Germany

Keywords X-ray microdiffraction, KOSSEL technique, XRT technique, EBSD technique, determination of lattice parameters, determination of residual stress, residual strain, electrical sheets, laser scribing
PACS 61.10.-I, 07.85.Jy
DOI 10.1002/crat.200710938

States of residual stress in laser scribed FeSi3 electrical sheets in the vicinity of the laser scratch have been investigated. The influence of the laser treatment on the distortion of the crystal lattice was not only determined qualitatively but also quantitatively. Residual stresses of third kind were determined. Residual stress maps of the vicinity of the laser scratch were recorded showing clearly the influence of the laser treatment on the stress state as well as on the formation of the domain structure in FeSi3. The dislocation densities and stress states could be determined on spots of micrometer size. This was made possible by coupling the KOSSEL and electron backscatter diffraction (EBSD) techniques in one device at high lateral resolution.




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