Crystal Research and Technology
Cryst. Res. Technol. 42, 1185 (2007) - Abstract -

Numerical investigation of crystal growth process of bulk Si and nitrides – a review

K. Kakimoto, L. Liu, H. Miyazawa, S. Nakano, D. Kashiwagi, X. J. Chen, and Y. Kangawa

Research Institute for Applied Mechanics, Kyushu University, 6-1, Kasuga-Koen, Kasuga 816-8580, Japan

Keywords computer simulation, global modeling, Czochralski method, semiconducting silicon
PACS 68.08.-p, 81.10.Dn, 47.27.Te
DOI 10.1002/crat.200711004

Heat and mass transfer during crystal growth of bulk Si and nitrides by using numerical analysis was studied. A three-dimensional analysis was carried out to investigate temperature distribution and solid-liquid interface shape of silicon for large-scale integrated circuits and photovoltaic silicon. The analysis enables prediction of the solid-liquid interface shape of silicon crystals. The result shows that the interface shape became bevel like structure in the case without crystal rotation. We also carried out analysis of nitrogen transfer in gallium melt during crystal growth of gallium nitride using liquid-phase epitaxy. The result shows that the growth rate at the center was smaller than that at the center.





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