Crystal Research and Technology
Cryst. Res. Technol. 43, 273 (2008) - Abstract -

Influence of substrate temperature on the structure of ZnO:Al thin films

S. M. Rozati and Sh. Akeste

Department of physics, Guilan University, Rasht 41335, Iran

Keywords ZnO, ZnO:Al, transparent conductive oxide, XRD
PACS 61.10.Nz, 68.55.-a
DOI 10.1002/crat.200711055

ZnO: Al films were prepared using low cost spray pyrolysis technique. The dependence of the physical properties on the substrate temperature was studied. The best films obtained at 500°C substrate temperature with preferred [002] orientation. The sheet resistance decreases with increased substrate temperature, and values as low as Rsh = 207 Ω/cm2 are reached for substrate temperature of 500°C. The optical transmittance of films increased by increasing the substrate temperature and received to 75% at 500°C.




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